F05500 - SEMI F55 - マスフローコントローラの耐腐食性を求めるための試験方法 Revision:SEMI F55-0600 (Reapproved 0412) - Superseded • Epitaxial wafers with buried

• Epitaxial wafers with buried layer (refer to SEMI M61)

酸素析出物も絶縁破壊耐圧劣化の原因となるが ，購入直後のウェーハでは，通常酸素析出物はほとんど含まれておらず，GOIへの影響はほとんど無い。従って，本スタンダードでの議論の対象としない。

3 and ¶ 6

SEMI S14-0704 (technical revision)

SEMI F60 — Test Method for ESCA Evaluation of Surface Composition of Wetted Surfaces of Passivated 316L Stainless Steel Components

F05500 - SEMI F55 - マスフローコントローラの耐腐食性を求めるための試験方法 Revision:SEMI F55-0600 (Reapproved 0412) - Superseded • Epitaxial wafers with buriedNOTICE: This translation is a REFERENCE COPY ONLY. If differences should exist between the English version and a translation in any other language, the English version is the official and authoritative version. SEMI SEMI Gases Global Technical Committee20111224global Audits and Reviews Subcommittee20124www. semiviews. org www. semi. org2000620073 : MFCMFC HClHClMFCMFCMFC Referenced SEMI Standards SEMI F1 Specification for Leak Integrity of High Purity