SrTiO3 (100) 1" dia. x0.5 mm Epi polished wafer 1 SP - STOa25D05C1 Gloveboxes & Dry Rooms Current collector (substrate): Aluminum foil

Current collector (substrate): Aluminum foil (16 microns

the PTFE flange may melt off if the furnace temperature is higher than 500ºC

Please bake the powder in a vacuum oven at 120 - 150 °C before making slurry and coating to ensure max

Dimension:  76

19mm (for positive side case

SrTiO3 (100) 1" dia. x0.5 mm Epi polished wafer 1 SP - STOa25D05C1 Gloveboxes & Dry Rooms Current collector (substrate): Aluminum foilSrTiO3 single crystal provides a good lattice match to most materials with Perovskite structure. It is an excellent substrate for epitaxial growth of HTS and many oxide thin films. SrTiO3 single crystal has also been used widely for special optical windows and as high quality sputtering target. MTI has the full production line to manufacture first the high purity SrTiO3 powder, then the single crystal boules and finally the epi polished substrates in